High-density silicon nitride deposited at low substrate temperature with high deposition rate using hot wire chemical vapour deposition-Reference-Cited by-同舟云学术

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High-density silicon nitride deposited at low substrate temperature with high deposition rate using hot wire chemical vapour deposition

Published:2007-09 Issue:22-23 Volume:201 Page:9285-9288
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Verlaan V.,Bakker R.,van der Werf C.H.M.,Houweling Z.S.,Mai Y.,Rath J.K.,Schropp R.E.I.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference42 articles.

1. Trap-state density in continuous-wave laser-crystallized single-grainlike silicon transistors

2. Electrical and noise characterization of bottom-gated nanocrystalline silicon thin-film transistors

3. Bulk and surface passivation of silicon solar cells accomplished by silicon nitride deposited on industrial scale by microwave PECVD

4. Carrier trap passivation in multicrystalline Si solar cells by hydrogen from SiNx:H layers

5. Industrial high-rate (∼5 nm/s) deposited silicon nitride yielding high-quality bulk and surface passivation under optimum anti-reflection coating conditions

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1. Chemical Vapor Deposition for Advanced Polymer Electrolyte Fuel Cell Membranes;ChemElectroChem;2022-02-14

2. Silicon Nitride Photonics for the Near-Infrared;IEEE Journal of Selected Topics in Quantum Electronics;2020-03

3. Hot wire chemical vapor deposition for silicon photonics: An emerging industrial application opportunity;Thin Solid Films;2019-04

4. Exceptional silicon surface passivation by an ONO dielectric stack;Solar Energy Materials and Solar Cells;2019-01

5. Numerical analysis of monocrystalline silicon solar cells with fine nanoimprinted textured surface;Japanese Journal of Applied Physics;2017-01-11

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