Properties of hydrogenated amorphous carbon films deposited by PECVD and modified by SF6 plasma-Reference-Cited by-同舟云学术

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Properties of hydrogenated amorphous carbon films deposited by PECVD and modified by SF6 plasma

Published:2011-11 Issue:4 Volume:206 Page:640-645
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Marins N.M.S.,Mota R.P.,Honda R.Y.,Nascente P.A.P.,Kayama M.E.,Kostov K.G.,Algatti M.A.,Cruz N.C.,Rangel E.C.

Funder

CNPq

FAPESP

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference26 articles.

1. Diamond-like amorphous carbon

2. Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon–nitrogen films

3. Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

4. Novel Low k Dielectrics Based on Diamondlike Carbon Materials

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