OES monitoring of sequential deposition of C/W layers by PECVD/magnetron sputtering techniques-Reference-Cited by-同舟云学术

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OES monitoring of sequential deposition of C/W layers by PECVD/magnetron sputtering techniques

Published:2011-07 Issue: Volume:205 Page:S402-S406
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Acsente T.,Ionita E.R.,Stancu C.,Ionita M.D.,Dinescu G.,Grisolia C.

Funder

EURATOM

Bilateral S&T Cooperation Agreement

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference14 articles.

1. Deposition and characterization of nanostructured metal/carbon composite films

2. Optical properties of nickel-incorporated amorphous carbon film deposited by femtosecond pulsed laser ablation

3. Optical properties of titanium containing amorphous hydrogenated carbon films (a-C:H/Ti)

4. Hemocompatibility of diamondlike carbon–metal composite thin films

5. Etching of carbon–tungsten composite with oxygen plasma

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of the Growth Mechanisms of a-CHx Coatings Deposited by Pulsed Reactive Magnetron Sputtering;The Journal of Physical Chemistry C;2012-05-24

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