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Air-based deposition of titanium‑aluminum oxynitride thin films by reactive magnetron sputtering

  • Published:2022-04 Issue: Volume:436 Page:128287
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Fan Hui-Ping,Yang Xin-Xian,Lu Fu-Hsing

Funder

Ministry of Science and Technology, Taiwan

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference45 articles.

1. Metallic Oxynitride Thin Films by Reactive Sputtering And Related Deposition Methods: Processes, Properties And Applications;Vaz,2013

2. Structure and mechanical properties of arc evaporated Ti-Al-O-N thin films;Sjölén;Surf. Coat. Technol.,2007

3. Optical characterization of TiAlN/TiAlON/SiO2 absorber for solar selective applications;Rebouta;Surf. Coat. Technol.,2012

4. Single layer and multilayer wear resistant coatings of (Ti, Al)N: a review;PalDey;Mater. Sci. Eng. A,2003

5. Titanium aluminum nitride films: a new alternative to TiN coatings;Münz;J. Vac. Sci. Technol. A,1986
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