A new type of quadrupole correction lens for electron-beam lithography-Reference-Cited by-同舟云学术

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A new type of quadrupole correction lens for electron-beam lithography

Published:1990-12 Issue:1-3 Volume:298 Page:488-495
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Okayama Shigeo

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference17 articles.

1. Electron-beam lithography system using a quadrupole triplet

2. Advances in Electronics and Electron Physics;Hawkes,1970

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