Low-pressure oxidation of tantalum at 1300°–1800°C-Reference-Cited by-同舟云学术

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Low-pressure oxidation of tantalum at 1300°–1800°C

Published:1964-10 Issue:4 Volume:7 Page:241-266
ISSN:0022-5088
Container-title:Journal of the Less Common Metals
language:en
Short-container-title:Journal of the Less Common Metals

Author:

Kofstad P.

Publisher

Elsevier BV

Subject

General Engineering

Reference20 articles.

1. Studies of the oxidation of tantalum at 1000°–1300°C

2. High temperature metallographic microscope studies of the initial oxidation of tantalum

3. The Oxidation Behavior of Tantalum at 700°–1000°C

4. An X-Ray Investigation of the Tantalum-Oxygen System.

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