Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
Author:
Publisher
Elsevier BV
Subject
Biomaterials,Bioengineering,Mechanics of Materials
Reference29 articles.
1. Sodium migration through electron-gun evaporated Al2O3 and double layer Al2O3SiO2 structures
2. Sequential surface chemical reaction limited growth of high quality Al2O3dielectrics
3. Atomic layer epitaxy
4. Al2O3‐SILICON INSULATED GATE FIELD EFFECT TRANSISTORS
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