Plasma enhanced growth, composition and refractive index of silicon oxynitride films
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference25 articles.
1. Furnace formation of silicon oxynitride thin dielectrics in nitrous oxide (N2O): The role of nitric oxide (NO)
2. Effect of thermally nitrided SiO2thickness on MIS characteristics
3. Radiation Hardening of Thermal Oxides on Silicon by Displacement Damage
4. Comparison of I-V, CV, and chemical data for quality control studies of SiO/sub x/N/sub y/ films on Si
5. Improvement of thin-gate oxide integrity using through-silicon-gate nitrogen ion implantation
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