A kinetic study of the reaction between nitrogen trifluoride and hydrogen atoms
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference16 articles.
1. Chemical hydrogen fluoride lasers from nitrogen fluoride-molecular hydrogen and nitrogen fluoride-ethane systems
2. Pulsed discharge initiated chemical lasers - Part II: HF laser emission from NF3and N2F4systems
3. Thermally initiated HF chemical laser
4. Atom—Molecule Kinetics at High Temperature Using ESR Detection. Technique and Results for O +H2, O +CH4, and O +C2H6
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1. Highly selective Si3N4/SiO2etching using an NF3/N2/O2/H2remote plasma. I. Plasma source and critical fluxes;Journal of Vacuum Science & Technology A;2020-03
2. Quantum Chemical Investigation for Chemical Dry Etching of SiO2by Flowing NF3into H2Downflow Plasma;Japanese Journal of Applied Physics;2012-01-01
3. Quantum Chemical Investigation for Chemical Dry Etching of SiO$_{2}$ by Flowing NF$_{3}$ into H$_{2}$ Downflow Plasma;Japanese Journal of Applied Physics;2011-12-20
4. Theoretical study of the reaction H+NF3→NF2+HF;Physical Chemistry Chemical Physics;2000
5. Kinetics and mechanism of the reaction of dichlorofluoroamine with hydrogen atoms;The Journal of Physical Chemistry;1991-10
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