Characteristics of high breakdown voltage Schottky barrier diodes using p+-polycrystalline-silicon diffused-guard-ring
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference16 articles.
1. Rectifying semiconductor contacts;Henisch,1957
2. High breakdown voltage Schottky barrier diode using p+-polycrystalline silicon diffused guard ring
3. Carrier transport across metal-semiconductor barriers
4. Use of a double diffused guard ring to obtain near ideal I–V characteristics in Schottky barrier diodes
5. Reverse current-voltage characteristics of metal-silicide Schottky diodes
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2. Electric Characteristic Enhancement of an AZO/Si Schottky Barrier Diode with Hydrogen Plasma Surface Treatment and AlxOx Guard Ring Structure;Materials;2018-01-08
3. Tuning electrical parameters of graphene/p-type polycrystalline silicon Schottky diodes by ultraviolet irradiation;Applied Physics A;2014-08-23
4. Barrier height adjustment of Schottky barrier diodes using a double-metal structure;Thin Solid Films;2013-10
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