Is there LOCOS after LOCOS?
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference39 articles.
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-07
2. Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11
3. Process capability of local oxidation of silicon isolation technology for sub-half micrometre custom IC applications;Electronics Letters;1999
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