Surfactant-aided supercritical carbon dioxide drying for photoresists to prevent pattern collapse-Reference-Cited by-同舟云学术

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Surfactant-aided supercritical carbon dioxide drying for photoresists to prevent pattern collapse

Published:2007-08 Issue:1 Volume:42 Page:150-156
ISSN:0896-8446
Container-title:The Journal of Supercritical Fluids
language:en
Short-container-title:The Journal of Supercritical Fluids

Author:

Lee Min Young,Do Kyung Min,Ganapathy Hullathy Subban,Lo Young Seop,Kim Ju Jin,Choi Sang Jun,Lim Kwon Taek

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,General Chemical Engineering

Reference22 articles.

1. Image collapse issues in photoresist;Simons;Proceedings of SPIE,2001

2. Prevention of photoresist pattern collapse by using liquid carbon dioxide;Jincao;Ind. Eng. Chem. Res.,2001

3. Effect of pressure on the static forces of micron-scale particle adhesion;Matthews;Ind. Eng. Chem. Res.,2000

4. Chemical-mechanical photoresist drying in supercritical carbon dioxide with hydrocarbon surfactants;Zhang;J. Vac. Sci. Technol. B,2004

5. Supercritical drying for water-rinsed resist systems;Namatsu;J. Vac. Sci. Technol. B,2000

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