Ultraviolet-irradiated precision polishing of diamond and its related materials-Reference-Cited by-同舟云学术

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Ultraviolet-irradiated precision polishing of diamond and its related materials

Published:2013-10 Issue: Volume:39 Page:14-19
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Watanabe Junji,Touge Mutsumi,Sakamoto Takeshi

Funder

Japan Society for the Promotion of Science

Grant-in-Aid for Scientific Research (B)

SEI Group CSR Foundation

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Study on the polishing of chemically vapour deposited diamond film

2. Thermochemical polishing of CVD diamond films

3. The preparation and characterization of low surface roughness (111) and (100) natural diamonds by hydrogen plasma

4. Atomic force microscopy study of atomically flat (001) diamond surfaces treated with hydrogen plasma

5. Surface smoothing of single-crystal diamond (100) substrate by polishing technique

Cited by 57 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental study on single crystal diamond CMP based on Fenton reaction and analysis of oxidation mechanism;Materials Science in Semiconductor Processing;2024-11

2. Advanced polishing methods for atomic-scale surfaces: A review;Materials Today Sustainability;2024-09

3. Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica;Applied Surface Science;2024-04

4. Tribological behavior of single-crystal diamond in a UV photocatalytic-Fenton composite reaction environment;Wear;2024-01

5. Tribological behavior of polycrystalline diamond based on photo-Fenton reaction;Diamond and Related Materials;2023-12

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