Experimental study on single crystal diamond CMP based on Fenton reaction and analysis of oxidation mechanism-Reference-Cited by-同舟云学术

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Experimental study on single crystal diamond CMP based on Fenton reaction and analysis of oxidation mechanism

Published:2024-11 Issue: Volume:182 Page:108739
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Luo Ziyuan,Lu Jiabin,Zeng Jun,Wang Xinhan,Yan Qiusheng

Funder

Guangdong Provincial Natural Science Foundation

Special Fund Project for Science and Technology Innovation Strategy of Guangdong Province

Guangdong University of Technology

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference33 articles.

1. Semiconductor infrared plasmonics;Taliercio;Nanophotonics,2019

2. Diamond semiconductor and elastic strain engineering;Dang;J. Semiconduct.,2022

3. Influence mechanism of defects on the subsurface damage and structural evolution of diamond in CMP process;Yuan;Appl. Surf. Sci.,2021

4. Wide bandgap semiconductor-based integrated circuits;Yuvaraja;Chip,2023

5. Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing;Liu;Diam. Relat. Mater.,2022

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