Correlation study of microstructure and photoluminescence properties of a-C:H thin films deposited by plasma-enhanced chemical vapor deposition technique-Reference-Cited by-同舟云学术

Correlation study of microstructure and photoluminescence properties of a-C:H thin films deposited by plasma-enhanced chemical vapor deposition technique

Published:2017-11 Issue: Volume:80 Page:76-83
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Li Mingming,Jiang Lihua,Sun Yihua,Xiao Ting,Xiang Peng,Tan Xinyu

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference42 articles.

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3. Raman spectroscopy of hydrogenated amorphous carbons;Casiraghi;Phys. Rev. B,2005

4. a-C:H thin films deposited by radio-frequency plasma: influence of gas composition on structure, optical properties and stress levels;Tomasellaa;Surf. Coat. Technol.,2001

5. Influence of PE-CVD parameters on the properties of diamond-like carbon films;Caschera;Thin Solid Films,2011

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