Influence of argon gas pressure and target power on magnetron plasma parameters-Reference-Cited by-同舟云学术

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Influence of argon gas pressure and target power on magnetron plasma parameters

Published:2009-05 Issue:5-8 Volume:18 Page:995-998
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Nguyen T.,Ulrich S.,Bsul J.,Beauvais S.,Burger W.,Albers A.,Stüber M.,Ye J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Diamond-like amorphous carbon

2. Sheath motion in a capacitively coupled radio frequency discharge

3. Double-Probe Method for Determination of Electron Temperatures in Steady and Time-Varying Gas Discharges

4. The collection of positive ions by a probe in an electrical discharge

5. Influence of the process gas, gas pressure, r.f. power and geometrical arrangement on the magnetron plasma parameters for various thin film materials of the systems Ti=N and B=C=N

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1. Diamond-like carbon (DLC) coating on graphite: Investigating the achievement of maximum wear properties using the PECVD method;Ceramics International;2024-06

2. The influence of Ti plasma etching pre‐treatment on mechanical properties of DLC film on cemented carbide;Surface and Interface Analysis;2021-12-28

3. Effect of sp3 Content on Adhesion and Tribological Properties of Non-Hydrogenated DLC Films;Materials;2020-04-18

4. Investigation and optimization of the tribo-mechanical properties of CrAlCN coatings using Design of Experiments;Surface and Coatings Technology;2016-12

5. Ion Bombardment Effects on Internal Stress of Ni Thin Film during Sputter Deposition Process;Journal of the Japan Institute of Metals and Materials;2014

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