Strain-controlled boron and nitrogen doping of amorphous carbon layers for hard mask applications-Reference-Cited by-同舟云学术

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Strain-controlled boron and nitrogen doping of amorphous carbon layers for hard mask applications

Published:2016-10 Issue: Volume:69 Page:102-107
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Kim TaeWan,Kim Dongbin,Kim Yong-Sung,Park Sang Hyun,Lim Sung Kyu,Park Keun Oh.,Kim Taesung,Kang Sang-Woo

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Vertical-Channel STacked ARray (VCSTAR) for 3D NAND flash memory

2. Improvement of high resolution lithography by using amorphous carbon hard mask

3. Ultrahigh Selective Etching of SiO[sub 2] Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C[sub 4]F[sub 8]/CH[sub 2]F[sub 2]/O[sub 2]/Ar Plasmas

4. Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide

5. Comparative study on the properties of amorphous carbon layers deposited from 1-hexene and propylene for dry etch hard mask application in semiconductor device manufacturing

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental observation and characterization of amorphous carbon generated in graphene on gold nanoparticles;RSC Advances;2024

2. Boron-doped amorphous carbon deposited by DC sputtering for a hardmask: Microstructure and dry etching properties;Applied Surface Science;2023-11

3. Effect of N doping on the microstructure and dry etch properties of amorphous carbon deposited with a DC sputtering system;RSC Advances;2023

4. Amorphous Carbon Films for Electronic Applications;Advanced Materials;2022-11-21

5. Substrate Impact on MR Characteristics of Carbon Nano Films Explored via AFM and Raman Analysis;Materials;2021-06-30

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