Effect of Ar addition on uniformity of diamond growth by using microwave plasma chemical vapor deposition-Reference-Cited by-同舟云学术

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Effect of Ar addition on uniformity of diamond growth by using microwave plasma chemical vapor deposition

Published:2018-08 Issue: Volume:87 Page:143-148
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Yamada Hideaki,Chayahara Akiyoshi,Mokuno Yoshiaki

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference54 articles.

1. Physics and Applications of CVD Diamond,2008

2. “Frontier of Diamond for Electronics Applications”, supervised by N. Fujimori and S. Shikata,2008

3. Comprehensive Bibliography of Diamond Technology,2007

4. The diamond materials market for semiconductor devices will surpass $43M;Diamond Materials for Semiconductor Applications report,2013

5. Formation and characterization of 4-inch GaN-on-diamond substrates;Francis;Diam. Relat. Mater.,2010

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5. Study of horizontal and vertical uniformity of B-doped layer on mosaic single crystal diamond wafers by using hot-filament chemical vapor deposition;Functional Diamond;2022-05-05

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