Author:
Vikharev A.L.,Gorbachev A.M.,Lobaev M.A.,Radishev D.B.
Funder
Russian Science Foundation
Subject
Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials
Reference34 articles.
1. Microwave plasma-assisted diamond film deposition;Grotjohn,2002
2. Diamond synthesis from gas phase in microwave plasma;Kato;J. Cryst. Growth,1983
3. Novel microwave plasma reactor for diamond synthesis;Funer;Appl. Phys. Lett.,1998
4. A circumferential antenna ellipsoidal cavity type MPCVD reactor developed for diamond deposition;Li;Diam. Relat. Mater.,2015
5. J. Asmussen, J. Zhang, Apparatus for the coating of material on a substrate using a microwave or UHF plasma, US Patent 5311103, 1994.
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