Gas composition at the substrate in MW-CVD diamond growth: An old problem revisited
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Thin film diamond growth mechanisms
2. Modeling of the gas-phase chemistry in C–H–O gas mixtures for diamond chemical vapor deposition
3. An investigation of product distributions in microwave plasma for diamond growth
4. Optical emission spectroscopic studies of microwave enhanced diamond CVD using CH 4 /CO 2 plasmas
5. Effects of NH3 and N2 additions to hot filament activated CH4/H2 gas mixtures
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Investigation of the combined effect of argon addition and substrate bias on the growth of ultrananocrystalline diamond layers;Diamond and Related Materials;2009-12
2. Thermodynamic Aspects of Diamond/β-SiC Composite Films;Chemical Vapor Deposition;2008-04
3. Diamond growth on Fe-Cr-Al alloy by H2-plasma enhanced graphite etching;Journal of Applied Physics;2007-04
4. Ethynyl (C2H): A major player in the chemical vapor deposition of diamond;Applied Physics Letters;2007-01-29
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