Prestressing method to inhibit crack initiation and expansion in a large-sized diamond film during polishing
Author:
Funder
North China University of Technology
National Natural Science Foundation of China
Publisher
Elsevier BV
Reference21 articles.
1. Effects of the electric field at the edge of a substrate to deposit a Ø100 mm uniform diamond film in a 2.45 GHz MPCVD system;An;Plasma Sci. Technol.,2022
2. The effect of substrate holder size on the electric field and discharge plasma on diamond-film formation at high deposition rates during MPCVD;An;Plasma Sci. Technol.,2017
3. Correlation between optical emission spectra and the process parameters of a 915 MHz microwave plasma CVD reactor used for depositing polycrystalline diamond coatings;Mallik;Indian Acad. Sci.,2014
4. Diamond mirrors for high-power continuous-wave lasers;Atikian;Nat. Commun.,2022
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