a-CN thin film properties as a function of laser ablation plasma parameters-Reference-Cited by-同舟云学术

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a-CN thin film properties as a function of laser ablation plasma parameters

Published:2007-04 Issue:4-7 Volume:16 Page:1291-1294
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Escobar-Alarcón L.,Arrieta A.,Camps E.,Romero S.,Muhl S.,Camacho-López M.A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Pulsed Laser Deposition of Thin Films, Chap. 13;Hubler,1994

2. Fabrication of LiCoO2 thin-film cathodes for rechargeable lithium microbatteries

3. Effect of the plasma parameters on the properties of titanium nitride thin films grown by laser ablation

4. Pulsed laser deposition of diamond‐like carbon films

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2. Thermo-oxidation of carbon codeposits and particles release during laser ablation in an oxygen atmosphere and its extrapolation to ITER codeposits;Fusion Engineering and Design;2015-11

3. Amorphous carbon nitride thin films for electrochemical electrode: Effect of molecular structure and substrate materials;Carbon;2015-11

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5. Characterization of CN_x/Si Using RBS, NRA and AES Techniques;Advanced Materials Research;2011-04

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