Author:
Feigl T.,Heber J.,Gatto A.,Kaiser N.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. D. Attwood, Soft X-rays and Extreme Ultraviolet Radiation: principles and applications, Cambridge University Press, Cambridge, 2000.
2. S. Bajt, et al., Improved reflectance and stability of Mo/Si multilayers, Proceedings of the SPIE, Vol. 4506 (2001) 65.
3. H.-J. Voorma, Mo/Si multilayer optics for micro-lithography, Thesis, Technische Universiteit Delft, 1997.
4. D.A. Tichenor, et al., Initial results from the EUV Engineering Test Stand, Proceedings of the SPIE, Vol. 4506 (2001) 9.
5. R. Soufli, et al., Multilayer optics for an extreme ultraviolet lithography tool with 70nm resolution, Proceedings of the SPIE Vol. 4343 (2000) 51.
Cited by
15 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献