<title>Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

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Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Published:2001-08-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Soufli Regina,Spiller Eberhard A.,Schmidt Mark A.,Davidson Courtney,Grabner R. Fred,Gullikson Eric M.,Kaufmann Benjamin B.,Mrowka Stanley,Baker Sherry L.,Chapman Henry N.,Hudyma Russell M.,Taylor John S.,Walton Christopher C.,Montcalm Claude,Folta James A.

Publisher

SPIE

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Non-contact XUV metrology of Ru/B4C multilayer optics by means of Hartmann wavefront analysis;Applied Optics;2018-02-14

2. Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics;SPIE Proceedings;2012-10-15

3. Nanometer interface and materials control for multilayer EUV-optical applications;Progress in Surface Science;2011-12

4. High performance EUV multilayer optics;Advances in Optical Thin Films III;2008-09-19

5. Phase defect inspection of multilayer masks for 13.5nm optical lithography using PEEM in a standing wave mode;Surface Science;2007-10

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