Sc–Si normal incidence mirrors for a VUV interval of 35–50 nm-Reference-Cited by-同舟云学术

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Sc–Si normal incidence mirrors for a VUV interval of 35–50 nm

Published:2000-06 Issue:1-2 Volume:448 Page:147-151
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Uspenskii Yu.A,Levashov V.E,Vinogradov A.V,Fedorenko A.I,Kondratenko V.V,P.Pershin Yu,Zubarev E.N,Mrowka S,Schäfers F

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference11 articles.

1. Soft X-Ray Optics;Spiller,1994

2. Handbook of Optical Constants of Solids;Palik (Ed.),1985

3. Use of trilevel resists for high‐resolution soft‐x‐ray projection lithography

4. Synthesis and measurement of OsSi multilayer mirrors optimized for the wavelength 380 Å

5. High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35–50??nm

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1. Narrowband Mg/SiC multilayer mirror working as high-harmonic selector at 30.4 nm wavelength;Journal of Optics;2024-04-11

2. Focusing Diffraction Optics for Orbital Telescopes;Optics and Spectroscopy;2023-10

3. Structure and stability of Sc/Si multilayers with different thickness ratio for wavelength at 46.5 nm;Advances in X-Ray/EUV Optics and Components XV;2020-08-21

4. Interface study of Sc/Si multilayers;Applied Surface Science;2020-06

5. Interface Study on the Effect of Carbon and Boron Carbide Diffusion Barriers in Sc/Si Multilayer System;ACS Applied Materials & Interfaces;2020-05-04

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