Interface Study on the Effect of Carbon and Boron Carbide Diffusion Barriers in Sc/Si Multilayer System-Reference-Cited by-同舟云学术

Interface Study on the Effect of Carbon and Boron Carbide Diffusion Barriers in Sc/Si Multilayer System

Published:2020-05-04 Issue:22 Volume:12 Page:25400-25408
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Zhu Jingtao¹^ORCID,Zhang Jiayi¹,Jiang Hui²^ORCID,Zhu Jie¹,Zhu Shengming¹,Li Miao¹,Ji Bin¹,Zhao Jiaoling³

Affiliation:

1. MOE Key Laboratory of Advanced Micro-structured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

2. Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai 201204, China

3. Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

Funder

Ministry of Education of the People's Republic of China

Youth Innovation Promotion Association of the Chinese Academy of Sciences

National Natural Science Foundation of China

NSAF

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c03563

Reference27 articles.