Reply to comment on “Penetration of corrosive species into copper exposed to simulated O2-free groundwater by time-of-flight secondary ion mass spectrometry (ToF-SIMS)”

Author:

Pan Jinshan,Yue Xiaoqi,Malmberg Per,Isotahdon Elisa,Ratia-Hanby Vilma,Huttunen-Saarivirta Elina,Leygraf Christofer

Funder

Vetenskapsrådet

NKS

Publisher

Elsevier BV

Subject

General Materials Science,General Chemical Engineering,General Chemistry

Reference13 articles.

1. Penetration of corrosive species into copper exposed to simulated O2-free groundwater by time-of-flight secondary ion mass spectrometry (ToF-SIMS);Yue;Corros. Sci.,2023

2. A. Hedin, C. Lilja, F. King, D.W. Shoesmith, P.G. Keech, Comment on “Penetration of corrosive species into copper exposed to simulated O2-free groundwater by time-of-flight secondary ion mass spectrometry (ToF-SIMS)”, Corros. Sci., submitted.

3. Copper corrosion in aqueous sulfide solutions under nuclear waste repository conditions;Chen;Mater. Res. Soc. Symp. Proc.,2012

4. Corrosion of copper in sulphide containing environment: the role and properties of sulphide films – Annual report 2021;Isotahdon;NKS-460, Nord. Nucl. Saf. Res. NKS,2022

5. Determination of the oxide scale growth mechanism using 18O-tracer experiments in combination with transmission electron microscopy and nanoscale secondary ion mass spectrometry;F.-Windisch;Mater. Character,2018

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