First-principles insight into the pH-dependency of the corrosion inhibition ability of benzotriazole and 1,2,4-triazole for copper in chemical mechanical polishing slurry-Reference-Cited by-同舟云学术

First-principles insight into the pH-dependency of the corrosion inhibition ability of benzotriazole and 1,2,4-triazole for copper in chemical mechanical polishing slurry

Published:2024-05 Issue: Volume:232 Page:112002
ISSN:0010-938X
Container-title:Corrosion Science
language:en
Short-container-title:Corrosion Science

Author:

Chang Pengfei,Huang Zisheng,Ling Huiqin,Wu Yunwen,Li Ming,Hang Tao

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference55 articles.

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3. Surface action mechanism and planarization effect of sarcosine as an auxiliary complexing agent in copper film chemical mechanical polishing;Zhou;Appl. Surf. Sci.,2020

4. Electrochemical corrosion behavior and theoretical simulation of cobalt in chemical mechanical polishing process;Ye;Electrochim. Acta,2023

5. Exploring combined effect of nitrilotriacetic acid and inhibitor on copper surface in alkaline solution: insights from experiments and molecular dynamics simulation studies;Zhang;J. Mol. Liq.,2021

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