Maskless lithography-Reference-Cited by-同舟云学术

Maskless lithography

Published:2005-02 Issue:2 Volume:8 Page:26-33
ISSN:1369-7021
Container-title:Materials Today
language:en
Short-container-title:Materials Today

Author:

Menon Rajesh,Patel Amil,Gil Dario,Smith Henry I.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference38 articles.

1. The Physics of Submicron Lithography;Valiev,1992

2. See, for example, Proceedings of Annual SPIE Symposia on Microlithography

3. Pease, R. F., Charged Particle Maskless Lithography, Presented at 30th International Conference on Micro & Nano Engineering 2004, to be published Microelectron. Eng.

4. Distributed, multiple variable shaped electron beam column for high throughput maskless lithography

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