A future technology for silicon wafer processing for ULSI

Author:

Abe Takao

Publisher

Elsevier BV

Subject

General Engineering

Reference4 articles.

1. Presented at the Japan Precision Engineering Meeting;Omori,1989

2. M. C. Show Grinding Symposium Proceeding;Yoshioka,1985

3. 1st International Conference on Vibration Control in Optics and Metrology;Kanai,1987

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1. Vacancy-type defects induced by grinding of Si wafers studied by monoenergetic positron beams;Journal of Applied Physics;2014-10-07

2. A state-of-the-art review of ductile cutting of silicon wafers for semiconductor and microelectronics industries;The International Journal of Advanced Manufacturing Technology;2012-02-05

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4. Ultraprecision grinding technologies in silicon semiconductor processing;Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture;2004-03-01

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