Vacancy-type defects induced by grinding of Si wafers studied by monoenergetic positron beams

Author:

Uedono Akira1,Mizushima Yoriko23,Kim Youngsuk34,Nakamura Tomoji2,Ohba Takayuki3,Yoshihara Nakaaki1,Oshima Nagayasu5,Suzuki Ryoichi5

Affiliation:

1. Division of Applied Physics, Faculty of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

2. Devices & Materials Labs Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan

3. ICE Cube Center, Tokyo Institute of Technology, Yokohama 226-8503, Japan

4. Disco Corporation, Ota, Tokyo 143-8580, Japan

5. Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan

Funder

ICE Cube Center, Tokyo Institute of Technology

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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1. Ultra-Thinning of 20 nm-Node DRAMs down to 3 µm for Wafer-on-Wafer (WOW) Applications;2021 IEEE 71st Electronic Components and Technology Conference (ECTC);2021-06

2. Reliability of Wafer-Level Ultra-Thinning down to 3 µm using 20 nm-Node DRAMs;2021 IEEE International Reliability Physics Symposium (IRPS);2021-03

3. Morphological characterization and mechanical behavior by dicing and thinning on direct bonded Si wafer;Journal of Manufacturing Processes;2020-10

4. Characterization of the distribution of defects introduced by plasma exposure in Si substrate;Journal of Vacuum Science & Technology A;2019-01

5. Evolution of Thermally-Induced Microstructural Defects in the Fe-9Cr Alloy;physica status solidi (a);2017-11-07

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