Absolute two-dimensional sub-micron metrology for electron beam lithography-Reference-Cited by-同舟云学术

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Absolute two-dimensional sub-micron metrology for electron beam lithography

Published:1985-01 Issue:1 Volume:7 Page:3-13
ISSN:0141-6359
Container-title:Precision Engineering
language:en
Short-container-title:Precision Engineering

Author:

Raugh M.R.

Publisher

Elsevier BV

Subject

General Engineering

Reference13 articles.

1. Matrix computations;Golub,1983

2. Optimization by vector space methods;Luenberger,1969

3. On characterizing measuring machine technology;Hocken,1979

4. Calibration algorithms for an electron beam lithography system;Lawson;Microelectronic Engng,1983

5. A method of calibrating a two-dimensional reference plate;Reeve,1979

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