Vibrational properties of SiO and SiH in amorphous SiOx:H films (0 ≤ x ≤ 2.0) prepared by plasma-enhanced chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference32 articles.
1. Variation of semiconductor properties through the SiOx region of Si SiO2 interfaces
2. Plasma-Chemical Vapor-Deposited Silicon Oxide/Silicon Oxynitride Double-Layer Antireflective Coating for Solar Cells
3. Electronic and structural properties of plasma-deposited a-Si:O:H - The story of O2
4. Infrared absorption spectra and compositions of evaporated silicon oxides (SiOx)
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