Effects of substrate bias on structure and properties of a-Si:H films deposited by ECR microwave plasmas-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Effects of substrate bias on structure and properties of a-Si:H films deposited by ECR microwave plasmas

Published:1987-12 Issue: Volume:97-98 Page:277-280
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Herak T.V.,Chau T.T.,Mejia S.R.,Shufflebotham P.K.,Schellenberg J.J.,Card H.C.,Kao K.C.,McLeod R.D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Fabrication of a-Si: H films by microwave plasmas under electron cyclotron resonance conditions

2. Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream

3. Growth of hydrogenated amorphous silicon due to controlled ion bombardment from a pure silane plasma

4. Oxidation of plasma-deposited hydrogenated amorphous silicon

5. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The energy distribution function of ions impinging on nanoparticles in a collisional low-pressure plasma;Plasma Sources Science and Technology;2012-05-02

2. Hydrogenated amorphous silicon deposited under accurately controlled ion bombardment using pulse-shaped substrate biasing;Journal of Applied Physics;2010-11-15

3. Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias;Japanese Journal of Applied Physics;2010-05-06

4. The effect of ion-surface and ion-bulk interactions during hydrogenated amorphous silicon deposition;Journal of Applied Physics;2007-10

5. Manipulating the Hydrogen-Bonding Configuration in ETP-CVD a-Si:H;MRS Proceedings;2007

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3