Microstructural properties of dc magnetron sputtered a-Si:H by IR spectroscopy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. Microstructure and properties of rf‐sputtered amorphous hydrogenated silicon films
2. Characterization of microvoids in device-quality hydrogenated amorphous silicon by small-angle x-ray scattering and infrared measurements
3. Reinterpretation of the silicon-hydrogen stretch frequencies in amorphous silicon
4. Optical properties of thin films
5. Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry
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1. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide;International Journal of Photoenergy;2014
2. Infrared spectroscopy characterization of 3C–SiC epitaxial layers on silicon;Journal of Physics D: Applied Physics;2012-11-09
3. Optimisation of Intrinsic a-Si:H Passivation Layers in Crystalline-amorphous Silicon Heterojunction Solar Cells;Energy Procedia;2012
4. Characterization of borate glasses by W-band pulse electron-nuclear double resonance spectroscopy;The Journal of Chemical Physics;2008-10-21
5. Infrared absorption strengths of ion-implanted hydrogenated amorphous silicon;Thin Solid Films;2008-03
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