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New amorphous silicon-boron alloy

Published:1985-12 Issue: Volume:77-78 Page:961-964
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Chik K.P,Du N,John P.K,Ou E,Rastogi A.C,Tam K.H,Tong B.Y,Wong S.K,Wu X.W,Yao J

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Highly stable, photosensitive evaporated amorphous silicon films

2. Post-hydrogenation of thermal LPCVD a-Si films

3. Chapter 8 Doping Effects in a-Si: H

4. Chapter 5 Carrier Mobility in a-Si: H

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparison of low-temperature oxidation of crystalline Si and B with a-Si:B alloy: An x-ray photoelectron spectroscopy study;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-03

2. Boron Induced Changes in the Structural Properties of Amorphous Silicon Boron Alloys;MRS Proceedings;1995

3. Amorphous Si:B films: Microstructure and electrical properties;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-07

4. The maximum possible conversion efficiency of silicon‐germanium thermoelectric generators;Journal of Applied Physics;1991-09

5. Study of Oxidation Properties of Amorphous Si:B Films;MRS Proceedings;1991

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