Effect of ion bombardment during plasma CVD on the film properties of a-Si:H studied by IEC plasma CVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
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1. Influence of deposition pressure on p-type a-Si:H window layer doped by trimethylboron for a-Si:H superstrate solar cell in plasma enhanced chemical vapor deposition;Materials Science in Semiconductor Processing;2013-04
2. Photoconducting a-Si:H films grown at high deposition rates by pulsing a VHF 100 MHz discharge;Thin Solid Films;2003-01
3. Growth of hydrogenated amorphous silicon and its alloys;Current Opinion in Solid State and Materials Science;1997-08
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