Influence of substrate bias on the properties of a-C:H films prepared by plasma CVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Electron-Diffraction Evidence for Threefold Coordination in Amorphous Hydrogenated Carbon Films
2. Clustering and gap states in amorphous carbon
3. Hard amorphous carbon studied by ellipsometry and photoluminescence
4. Photoluminescence investigation of a-C: H thin films
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2. Effect of precursor gas on the structure and mechanical properties of hydrogenated amorphous carbon films deposited on a trench sidewall;Journal of Applied Physics;2019-02-14
3. Analysis of microstructure and surface morphology of a-C:H films deposited on a trench target;Diamond and Related Materials;2018-03
4. Effect of Ar+ ion assist on the properties of a-C:H films deposited on a trench;Thin Solid Films;2017-06
5. Fabrication of a-C Semiconductor Nanoparticles for Quantum Dots Surface Emitting Laser Using High-Density Plasma in Localized Area;ECS Transactions;2016-08-25
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