Deposition of a-Si:H with the hot-wire technique
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. a‐Si : H produced by high‐temperature thermal decomposition of silane
2. Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon
3. High‐quality amorphous silicon germanium produced by catalytic chemical vapor deposition
4. Production of high‐quality amorphous silicon films by evaporative silane surface decomposition
5. Deposition of device quality, lowHcontent amorphous silicon
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1. Hydrogen Terminated Silicon Nanopowders: Gas Phase Synthesis, Oxidation Behaviour, and Si-H Reactivity;Silicon;2014-06-28
2. Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate;Journal of Applied Physics;2010-03
3. Problem of catalyst ageing during the hot-wire chemical vapour deposition of thin silicon films;Thin Solid Films;2009-04
4. Deposition of hydrogenated amorphous silicon (a-Si:H) films by hot-wire chemical vapor deposition (HW-CVD) method: Role of substrate temperature;Solar Energy Materials and Solar Cells;2007-05
5. The influence of filament material on radical production in hot wire chemical vapor deposition of a-Si:H;Thin Solid Films;2005-08
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