Towards high deposition rates of a-Si:H: The limiting factors
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference30 articles.
1. High-Rate Deposition of a-Si: H Film Using the Decomposition of Mono-Silane
2. High‐rate deposition of amorphous hydrogenated silicon from a SiH4plasma
3. Glow discharge preparation of amorphous hydrogenated silicon from higher silanes
4. High-rate deposition of amorphous hydrogenated silicon: effect of plasma excitation frequency
5. Microwave-Excited Plasma CVD of a-Si:H Films Utilizing a Hydrogen Plasma Stream or by Direct Excitation of Silane
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1. Surface passivation of c-Si for silicon heterojunction solar cells using high-pressure hydrogen diluted plasmas;AIP Advances;2015-09
2. Medium range order engineering in amorphous silicon thin films for solid phase crystallization;Journal of Applied Physics;2013-05-21
3. References;Plasma Nanoscience;2008-08-13
4. Study on thermal conductivity of hydrogenated amorphous silicon films;Acta Physica Sinica;2008
5. Synthesis of silicon nanocrystals in silane plasmas for nanoelectronics and large area electronic devices;Journal of Physics D: Applied Physics;2007-04-04
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