Influence of higher deposition temperature on a-Si:H material properties, powder formation and light-induced degradation, using the VHF (70 MHz) glow discharge technique-Reference-Cited by-同舟云学术

Influence of higher deposition temperature on a-Si:H material properties, powder formation and light-induced degradation, using the VHF (70 MHz) glow discharge technique

Published:1993-12 Issue: Volume:164-166 Page:59-62
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Kroll U.,Meier J.,Goetz M.,Howling A.,Dorier J.-L.,Dutta J.,Shah A.,Hollenstein Ch.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. The defect density in amorphous silicon

2. Influences of a high excitation frequency (70 MHz) in the glow discharge technique on the process plasma and the properties of hydrogenated amorphous silicon

3. Powder dynamics in very high frequency silane plasmas

4. In situ simultaneous radio frequency discharge power measurements

5. Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition

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