Integration of low dimensional crystalline Si into functional epitaxial oxides
Author:
Publisher
Elsevier BV
Subject
General Engineering
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1. 0.86-nm CET Gate Stacks With Epitaxial$hboxGd_2hboxO_3$High-$k$Dielectrics and FUSI NiSi Metal Electrodes
2. Fast and long retention-time nano-crystal memory
3. Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition
4. Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO2layer by a stencil-masked ultra-low energy ion implantation process
5. Memory effects in metal-oxide-semiconductor capacitors incorporating dispensed highly monodisperse 1nm silicon nanoparticles
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4. Size-dependent interface band alignment between Si nanocrystals and lattice-matched Gd2O3;Applied Physics Letters;2009-09-07
5. Epitaxial Lanthanide Oxide based Gate Dielectrics;MRS Proceedings;2009
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