Effect of annealing on the structural, optical and electrical properties of ITO films by RF sputtering under low vacuum level
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Published:2008-12
Issue:12
Volume:39
Page:1444-1451
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ISSN:0026-2692
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Container-title:Microelectronics Journal
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language:en
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Short-container-title:Microelectronics Journal
Subject
General Engineering
Cited by
74 articles.
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