Study of GaAs layers grown on Ge substrates by MOVPE and in situ monitored by laser reflectometry
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference23 articles.
1. Growth and properties of GaAs/AlGaAs on nonpolar substrates using molecular beam epitaxy
2. Heterojunctions and Metal–Semiconductor Junctions;Milnes,1972
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1. Analysis of in situ thin films epitaxy by reflectance spectroscopy: Effect of growth parameters;Superlattices and Microstructures;2019-07
2. Analysis of the VIS–NIR spectral reflectance of Bi/GaAs structures grown by MOVPE and UHVE;Journal of Crystal Growth;2014-06
3. Simulation of in situ reflectance-time during MOVPE of GaN on sapphire substrate;Superlattices and Microstructures;2013-12
4. Optical properties study of In.08Ga.92As/GaAs using spectral reflectance, photoreflectance and near-infrared Photoluminescence;Superlattices and Microstructures;2013-07
5. In Situ Spectral Reflectance Investigation of InAs/GaAs Heterostructures Grown by MOVPE;Journal of Electronic Materials;2011-11-19
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