Characterisation of titanium disilicide thin films
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference15 articles.
1. Refractory silicides for integrated circuits. critical review;Murarka;J. Vac. Sci. Technol.,1980
2. Refractory silicides of Ti and Ta for low-resistivity gates and interconnects;Murarka;IEEE J. Solid-State Circuits SC,1980
3. Silicides and local interconnections for high-performance VLSI applications;Mann;IBM J. Res. Develop.,1995
4. A thickness model for the TiSi2/TiN stack in the titanium salicide process module;Tsai;Thin Solid Films,1995
5. Titanium disilicide nanostructures: two phases and their surfaces;Medeiros-Ribeiro;Surf. Sci.,1999
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