Multiphysics simulation study of thermal stress effects in nanoscale FinFETs heterogeneously integrated with GaN high-power device on silicon substrate

Author:

Duan HualiORCID,Li Erping,Huang Qinyi,Xu Yuehang,Chen WenchaoORCID

Funder

Zhejiang Province Natural Science Foundation

Huimin Technology Research and Development Projects of Ningbo

Key Research and Development Program of Ningxia

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference38 articles.

1. Heterogeneous and monolithic 3D integration technology for mixed-signal ICs;Jeong;Electronics,2022

2. Heterogeneous integration enabled by the state-of-the-art 3DIC and CMOS technologies: design, cost, and modeling;Lin,2021

3. Heterogeneous and monolithic 3D integration of III–V-based radio frequency devices on Si CMOS circuits;Jeong;ACS Nano,2022

4. Development of GaN HEMTs fabricated on silicon, silicon-on-insulator, and engineered substrates and the heterogeneous integration;Hsu;Micromachines,2021

5. Heterogeneous integration for performance and scaling;Iyer;IEEE Trans. Compon. Packag. Manuf. Technol.,2016

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