Kinetics of hydride disintegration in a 2D Si channel formation by the Si–GeH4 MBE and demonstration of a Si/SiGe interface blurring in electrical characteristics of heterostructures
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference12 articles.
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2. Multilayer strained Si–SiGe structures: fabrication problems, interface characteristics and physical properties;Orlov;Opto Electron. Rev.,2003
3. Electrical characteristics and the energy band diagram of the isotype n-SiGe/n-Si heterojunction in relaxed structures;Orlov;Phys. Solid State,2004
4. The peculiarities of a non-stationary growth kinetics in GSMBE and their influence on Si/Si1−xGex interfaces abruptness;Orlov;Solid State Phenom.,1999
5. Mechanisms of alloy intermixing in the vicinity of the borderlands of the Si(Ge)/Si1−xGex structures grown by molecular beam epitaxy with combine sources;Orlov;Solid State Phenom.,2002
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Kinetics of surface pyrolysis of a silane–germane gas mixture under conditions of epitaxial film deposition of Si1–x Ge x solid solutions;Russian Journal of General Chemistry;2015-12
2. Features of electron transport in relaxed Si/Si1 − x Ge x transistor heterostructures with a high doping level;Semiconductors;2014-07
3. Anomalous electrical properties of Si/Si1 − x Ge x heterostructures with an electron transport channel in Si layers;Physics of the Solid State;2008-02
4. Peculiarities of the electrical characteristics of the pseudomorphous SiGe/Si MODFET structures with a corrugated surface;SPIE Proceedings;2006-05-24
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