Comparative study of the rate and locality of silica deposition during the CVD treatment of porous membranes with TEOS and TMOS-Reference-Cited by-同舟云学术

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Comparative study of the rate and locality of silica deposition during the CVD treatment of porous membranes with TEOS and TMOS

Published:2009-04 Issue:1-2 Volume:120 Page:177-185
ISSN:1387-1811
Container-title:Microporous and Mesoporous Materials
language:en
Short-container-title:Microporous and Mesoporous Materials

Author:

Labropoulos A.I.,Romanos G.E.,Karanikolos G.N.,Katsaros F.K.,Kakizis N.K.,Kanellopoulos N.K.

Publisher

Elsevier BV

Subject

Mechanics of Materials,Condensed Matter Physics,General Materials Science,General Chemistry

Reference35 articles.

1. Gas permeation characteristics of a hydrogen selective supported silica membrane

2. Chemical vapor deposition of hydrogen-permselective silica films on porous glass supports from tetraethylorthosilicate

3. Highly hydrogen selective ceramic membranes: application to the transformation of greenhouse gases

4. Preparation of SiO2 overlayers on oxide substrates by chemical vapor deposition of Si(OC2H5)4

5. Decomposition Chemistry of Tetraethoxysilane

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