Channelling effect on helium implantation behavior in copper single crystal
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference9 articles.
1. Computer Studies of the Slowing Down of Energetic Atoms in Crystals
2. Computer simulation of atomic-displacement cascades in solids in the binary-collision approximation
3. Implantation of 18O+ ions in channelling directions of aluminium, copper and nickel single crystals - I. — Experimental conditions and range profile determination
4. Implantation of 18O+ ions in channelling directions of aluminium, copper and nickel single crystals - II. — Stopping power determination by maximum range measurements
5. D. Moreno, E. Abramov and D. Eliezer (to be published).
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1. On the blister formation in copper alloys due to the helium ion implantation;Metallurgical and Materials Transactions A;1997-03
2. On the blister formation in copper alloys due to the helium ion implantation;Metallurgical and Materials Transactions A;1997-03
3. Structural changes in a copper alloy due to helium implantation;Scripta Materialia;1996-12
4. He bubble sites in implanted copper alloy;Scripta Materialia;1996-06
5. Diffusion, trapping and release process in the first-wall of thermonuclear fusion reactor;Journal of Nuclear Materials;1994-09
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