Origins of wear-induced tungsten corrosion defects in semiconductor manufacturing during tungsten chemical mechanical polishing-Reference-Cited by-同舟云学术

Origins of wear-induced tungsten corrosion defects in semiconductor manufacturing during tungsten chemical mechanical polishing

Published:2022-10 Issue: Volume:598 Page:153767
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Choi Seung-Hoon,Kreider Melissa E.,Nielander Adam C.,Stevens Michaela Burke,Kamat Gaurav,Koo Ja Eung,Bae Ki Ho,Kim Hoyoung,Yoon Il Young,Yoon Bo Un,Hwang Kihyun,Lee Dong Un,Jaramillo Thomas F.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference32 articles.

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3. Electrochemical Stability of Tungsten and Tungsten Monocarbide (WC) Over Wide pH and Potential Ranges

4. Electrochemical mechanism of layout-dependent corrosion of tungsten in contact plugs

5. K. Lee, J. Seo, J. Moon, Y. Jung, U. Paik, ECS Meet. Abstr. MA2016-02 (2016) 1112.

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